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10th International Symposium on Optical Storage (IWIS/ISOS 2016)
作者: irglass 时间: 2015-12-24 浏览:1,158 次

2016 International Workshop on Information Storage/10th International Symposium on Optical Storage (IWIS/ISOS 2016) 
 
10-13 April, 2016 
Changzhou, Jiangsu Province, China 
  
Sponsored by 
Shanghai Institute of Microsystem and Information Technology (SIMIT), Chinese Academy 
of Sciences 
Shanghai Institute of Optics and Fine Mechanics (SIOM), Chinese Academy of Sciences 
 
Co-Sponsored by 
National Natural Science Foundation of China 
Chinese Academy of Sciences (CAS) 
Science and Technology Commission of Shanghai Municipality 
 
Organized by 
Jiangsu University of Technology 
                            
 
 
Foreword 
IWIS/ISOS 2016—the 2016 International Workshop on Information Storage/10th International Symposium on Optical Storage will be held on April 10-13, 2016 in Changzhou, Jiangsu Province, China. The previous nine symposia of ISOS series were successfully held in Shanghai 1988, Chongqing 1990, Kunming 1992, Shenzhen 1996, Shanghai 2000, Wuhan 2002, Zhanjiang 2005, Wuhan 2008, and Shanghai 2012, respectively. The purpose of this symposium and workshop is to 
provide a forum for the update review of recent progresses in the field of information data storage (including information storage and optical storage) from material development to related technologies and applications. The symposium and workshop will serve to enhance interactions between researchers, engineers and product developers of the world-wide and to promote progress in this field. We believe that those who attend this symposium  will enjoy both the exchange of scientific and technical information and the memorable experience of the beauty Changzhou city of China. 

Topics 
IWIS/ISOS 2016 will discuss the present status  of information data storage media, components, systems and applications. In addition to contributed papers, a number of invited talks will be presented. The topics to be covered include, but are not restricted to: 
 
1.  Materials for data storage 
2.  Non-volatile memory 
3.  Optical storage 
4.  Magnetic and hybrid recording 
5.  Digital holographic storage 
6.  Near-field and super-resolution technology 
7.  Network storage 
8.  Drive technology and test methods 
9.  Manufacture technology 
10.  Standardization 
11.  New media and concept for data storage 
12.  Consumer products and marketing 
13.  Brain-inspired-computing and storage 
14.  Optical imaging and photolithography 
 
 
Preparation of Abstract and Manuscript 
 
Abstract 
Authors are requested to submit a 500-word abstract. Abstracts should be typed single spaced on a separate sheet of paper and arranged with the title at top 
of the page, followed by the authors name, affiliation, complete mailing address, tel. and fax numbers,Email and the body of the abstract. In case of  multiple authors, individual author’s names and addresses should be listed separately after the title. The abstract will appear in the Advance Program if it is accepted. 
 
Deadline for submission of abstracts: January 31, 2016. 
Abstracts (in MS word format) should reach IWIS/ISOS 2016 secretariat before January 31, 2016 by email to: iwis2016@mail.sim.ac.cn  
Authors will be notified electronically of acceptance before February 15, 2016. 
Submission of manuscripts: before March 15, 2016. 
 
 Committees 
 
Honorary Chair 
Fuxi Gan, Shanghai Institute of Optics and Fine Mechanics, CAS, China 
Chair 
Zhitang Song, Shanghai Institute of Microsystem and Information Technology, CAS, China 
 
International Advisory Committee 
Co-Chairs:  
Matthias Wuttig, RWTH Aachen, Germany Songlin Feng, Shanghai Advanced Research Institute, CAS, China 
Members: 
Fuxi Gan, Shanghai Institute of Optics and Fine Mechanics, CAS, China 
Lisong Hou, Shanghai Institute of Optics and Fine Mechanics, CAS, China 
Hongsik Jeong, Samsung Electronics Co., Ltd, Korea 
Masud Mansuripur, University of Arizona, USA 
Takeo Ohta, Ovonic Phase-Change Lab., Japan 
Young-Pil Park, Yonsei University, Korea   
Luping Shi, Tsinghua University, China 
Junji Tominaga, National Institute of Advanced Industrial Science & Technology, Japan 
Din Ping Tsai, National Taiwan University, Taipei, China 
Jian-Ping Wang, University of Minnesota, USA 
Noboru Yamada, Kyoto University, Japan 
Ze Zhang, Zhejiang University, China 
David Zhang, Fudan University, China 
Rong Zhao, Singapore University of Technology & Design, Singapore 
Shining Zhu, Nanjing University, China 
 
Local Organizing Committee 
Co-Chairs:  
Xiaoming Xie, Shanghai Institute of Microsystem and Information Technology, CAS, China 
Jianda Shao, Shanghai Institute of Optics and Fine Mechanics, CAS, China 
Zhongqiu Xie, Jiangsu University of Technology, China 
Members: 
Jingshi Fu, Dalian Hualu Optical Technology Co., Ltd., China   
Donghong Gu, Shanghai Institute of Optics and Fine Mechanics, CAS, China   
Qing Pan, National Natural Science Foundation of China 
Tiewei Luo, Amethystum Optoelectronics Co., Ltd., China 
Longfa Pan, Optical Memory National Engineering Research Center, China 
Koukou Suu, ULVAC, Japan 
Wendong Xu, Shanghai Institute of Optics and Fine Mechanics, CAS, China 
Lin Shen, Jiangsu University of Technology, China 
 
Technical Committee 
Co-Chairs:  
Zhitang Song, Shanghai Institute of Microsystem and Information Technology, CAS, China 
Yiqun Wu, Shanghai Institute of Optics and Fine Mechanics, CAS, China 
Members: 
Dan Feng, Huazhong University of Science and Technology, China 
Xiaodong Han, Beijing University of Technology 
Xiufeng Han, Institute of Physics, CAS, China 
Jinfeng Kang, Peking University, China 
Runwei Li, Ningbo Institue of Industrial Technology, CAS, China 
Yinyin Lin, Fudan University, China 
Bo Liu, Shanghai Institute of Microsystem and Information Technology, CAS, China 
Ming Liu, Institute of Microelectronics, CAS 
Qian Liu, National Center of Nano Science and Technology, China 
Xiangshui Miao, Huazhong University of Science and Technology, China 
Xiudong Sun, Harbin Institute of Technology, China 
Zhimei Sun, Beihang University, China Xiaodi Tan, Beijing Institute of Technology, China 
Yang Wang, Shanghai Institute of Optics and Fine Mechanics, CAS, China 
Jingsong Wei, Shanghai Institute of Optics and Fine Mechanics, CAS, China 
Huaqiang Wu, Tsinghua University, China 
Hongyu Yu, South University of Science and Technology of China 
Changsheng Xie, Optical Memory National Engineering Research Center, China 
Xiaoqin Zhu, Jiangsu University of Technology, China 
  
Secretariat 
Secretary General: 
Bo Liu, Shanghai Institute of Microsystem and Information Technology, CAS, China 
Yang Wang, Shanghai Institute of Optics and Fine Mechanics, CAS, China 
Xiaoqin Zhu, Jiangsu University of Technology, China 
Members: 
Sannian Song, Shanghai Institute of Microsystem and Information Technology, CAS, China 
Kui Zhang, Shanghai Institute of Optics and Fine Mechanics, CAS, China 
Yifeng Hu, Jiangsu University of Technology, China 

IWIS/ISOS 2016 secretariat 
Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences 
Room 403, Building No. 8, 865 Changning Road, Shanghai 200050, China 
Tel: +86-21-62511070-8403 
Fax: +86-21-62134404 
E-mail: iwis2016@mail.sim.ac.cn  
Websi te:  http://www.iwis2016.com